Paper
1 December 1991 Pressure effects in the microwave plasma growth of polycrystalline diamond
Alan B. Harker, Jeffrey F. DeNatale
Author Affiliations +
Abstract
Microwave plasma deposition of polycrystalline diamond is investigated over the pressure range 1 to 100 kPa. The conditions of growth, microstructure, and spectroscopic properties of the resulting materials are compared. A phenomenological description of the dependence of diamond microstructure upon growth conditions is developed.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alan B. Harker and Jeffrey F. DeNatale "Pressure effects in the microwave plasma growth of polycrystalline diamond", Proc. SPIE 1534, Diamond Optics IV, (1 December 1991); https://doi.org/10.1117/12.48274
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Cited by 2 scholarly publications.
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KEYWORDS
Plasma

Diamond

Microwave radiation

Particles

Etching

Hydrogen

Carbon

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