Multilayer thin-film design as far-ultraviolet quarterwave retarders

Jongmin Kim; Muamer Zukic; Douglas G. Torr; Michele Wilson McColgan

doi:10.1117/12.140574

21 January 1993 Multilayer thin-film design as far-ultraviolet quarterwave retarders

Jongmin Kim, Muamer Zukic, Douglas G. Torr, Michele Wilson McColgan

Proceedings Volume 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography; (1993) https://doi.org/10.1117/12.140574
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

At short wavelengths, such as FUV, transparent, optically active materials are scarce. Reflection phase retardation by a multilayer thin film can be a good alternative in this wavelength region. We design a multilayer quarterwave retarder by calculating the electric fields at each boundary in the multilayer thin film. Using this method, we achieve designs of FUV multilayers which provide high, matched reflectances for both s- and p-polarization states, and at the same time a phase difference between these two states of nearly 90 deg. For example, a quarterwave retarder designed at the Lyman-alpha line (121.6 nm) has 81.05 percent reflectance for the s-polarization and 81.04 percent for the p-polarization state. The phase difference between these two polarization states is 90.07 deg. For convenience the retarders are designed for 45 deg angle of incidence, but our design approach can be used for any other angle of incidence. Aluminum and MgF2 are used as film materials and an opaque thick film of aluminum as the substrate.

Citation Download Citation

Jongmin Kim, Muamer Zukic, Douglas G. Torr, and Michele Wilson McColgan "Multilayer thin-film design as far-ultraviolet quarterwave retarders", Proc. SPIE 1742, Multilayer and Grazing Incidence X-Ray/EUV Optics for Astronomy and Projection Lithography, (21 January 1993); https://doi.org/10.1117/12.140574

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