Paper
15 April 1993 Optimized replication of interferometrically generated deep diffractive structures by embossing into thermoplastics
Günter Lensch, Peter Lippert, Horst Kreitlow, Christel Budzinski
Author Affiliations +
Abstract
New optical elements can be realized interferometrically by generating holographic diffractive structures. For lasers in the infrared spectral region the rulings of these structures need to be 2 to 5 times deeper than in common uses. By structuring photoresists holographically, varying different parameters, ruling depths of 24 microns and depth to grating constants of 1.5 could be performed. These structures had been applied as masks to reactive ion etching in glass and copper. For economic embossing replication techniques nickel stampers had been manufactured by electroforming the diffractive photoresist structures. Optimization of the embossing parameters has been carried out successfully regarding different thermoplastic materials and the achievable diffraction efficiency.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Günter Lensch, Peter Lippert, Horst Kreitlow, and Christel Budzinski "Optimized replication of interferometrically generated deep diffractive structures by embossing into thermoplastics", Proc. SPIE 1780, Lens and Optical Systems Design, 17800R (15 April 1993); https://doi.org/10.1117/12.142821
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Interferometry

Holography

Photoresist materials

Copper

Glasses

Holographic interferometry

Infrared lasers

Back to Top