In-situ particle monitoring: today's technology drivers

Peter Borden; Martin Elzingre; Derek Aqui

doi:10.1117/12.221302

19 September 1995 In-situ particle monitoring: today's technology drivers

Peter Borden, Martin Elzingre, Derek Aqui

Proceedings Volume 2637, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing; (1995) https://doi.org/10.1117/12.221302
Event: Microelectronic Manufacturing '95, 1995, Austin, TX, United States

Abstract

In situ particle monitors (ISPMs) have seen rapidly increased acceptance in semiconductor production because they provide automated, 100% inspection of particle levels during process at a low cost per inspection point. As productivity enhancement tools, ISPM use is only justified when it increases productivity of the host tool. The sensors provide an indirect measure of wafer contamination, and are of greatest value when they provide a particle count that correlates to yield and has identifiable causes. Manufacturing integration has now become the key factor driving the future of ISPM technology. This paper will discuss some of these factors, including correlation, sensor placement, impact on sensor design, application of expertise to qualification and maintenance, and gauge capability.

Citation Download Citation

Peter Borden, Martin Elzingre, and Derek Aqui "In-situ particle monitoring: today's technology drivers", Proc. SPIE 2637, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing, (19 September 1995); https://doi.org/10.1117/12.221302

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