Paper
5 July 1996 Critical length of disorder for the onset of localization in YBa2Cu3O6.9films
Andrea Gauzzi, B. Johan Joensson, Arnaud Clerc-Dubois, Davor Pavuna
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Abstract
We report a combined analysis of resistivity and x-ray diffraction rocking curve measurements on c-axis oriented YBA2Cu3O6.9 films epitaxially grown on (100) SrTiO3 and LaAlO3 by ion-beam sputtering. We find that the growth-induced reduction of long-range lattice order in the films begins to depress superconductivity and normal conductivity at a critical value of lattice coherence length of approximately equals 10 and 5 nm for the two above types of substrates respectively. Evidence for disorder-induced localization is given by a deviation from linearity of the temperature-dependence of the resistivity which scales as the reduction of superconducting critical temperature. Similar nonlinear dependence observed in slightly reduced or lightly Co-doped samples suggests that the disorder in our films significantly affects the CuO chains. Our analysis of the paraconductivity term in the films gives evidence for the enhancement of the superconducting fluctuations by the disorder.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrea Gauzzi, B. Johan Joensson, Arnaud Clerc-Dubois, and Davor Pavuna "Critical length of disorder for the onset of localization in YBa2Cu3O6.9films", Proc. SPIE 2697, Oxide Superconductor Physics and Nano-Engineering II, (5 July 1996); https://doi.org/10.1117/12.250275
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KEYWORDS
Superconductors

Oxygen

Ion beams

Copper

Temperature metrology

Crystals

Sputter deposition

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