Optimization of CMOS infrared detector microsystems

Niklaus Schneeberger; Oliver Paul; Henry Baltes

doi:10.1117/12.250695

17 September 1996 Optimization of CMOS infrared detector microsystems

Niklaus Schneeberger, Oliver Paul, Henry Baltes

Proceedings Volume 2882, Micromachined Devices and Components II; (1996) https://doi.org/10.1117/12.250695
Event: Micromachining and Microfabrication '96, 1996, Austin, TX, United States

Abstract

We report the fabrication and characterization of nine different infrared detector microsystems produced with two different commercial CMOS processes. They consist of micromachined thermoelectric sensors with on-chip signal conditioning circuitry. We developed a model for the performance of such microsystems based on numerical finite element analysis of the sensor and performance figures of the circuitry. The model was validated by comparing calculated and experimental sensor outputs. Deviations between modeled and measured performance were smaller than 21 percent. The usefulness of the model to optimize the layout of thermoelectric infrared sensors wit respect to overall system performance is demonstrated.

Citation Download Citation

Niklaus Schneeberger, Oliver Paul, and Henry Baltes "Optimization of CMOS infrared detector microsystems", Proc. SPIE 2882, Micromachined Devices and Components II, (17 September 1996); https://doi.org/10.1117/12.250695

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