Realization of optoelectronic interconnection of exposure and reconstruction at the same wavelength

Guodong Liang; Mai Xu; Jiaqi Yu

doi:10.1117/12.251856

23 September 1996 Realization of optoelectronic interconnection of exposure and reconstruction at the same wavelength

Guodong Liang, Mai Xu, Jiaqi Yu

Proceedings Volume 2885, Holographic Optical Elements and Displays; (1996) https://doi.org/10.1117/12.251856
Event: Photonics China '96, 1996, Beijing, China

Abstract

An optoelectronic interconnection based on volume holographic coupling elements located on a light-guiding glass plate has been realized by exposure at the wavelength of 630 nm. A light beam is reconstructed at the same wavelength and guided by total internal reflection inside the glass plate. The contraction coefficients and the refractive index change of the thin film of red sensitive photopolymer have been measured. Coupling gratings with an accurate period and a slanted angle have been designed.

Citation Download Citation

Guodong Liang, Mai Xu, and Jiaqi Yu "Realization of optoelectronic interconnection of exposure and reconstruction at the same wavelength", Proc. SPIE 2885, Holographic Optical Elements and Displays, (23 September 1996); https://doi.org/10.1117/12.251856

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available