Ti(C,N) film formed by ion-beam-assisted deposition

Han-wei Liu; Yunru Chen; Hai-Tao Cai

doi:10.1117/12.267126

14 February 1997 Ti(C,N) film formed by ion-beam-assisted deposition

Han-wei Liu, Yunru Chen, Hai-Tao Cai

Proceedings Volume 3040, Smart Structures and Materials 1997: Smart Materials Technologies; (1997) https://doi.org/10.1117/12.267126
Event: Smart Structures and Materials '97, 1997, San Diego, CA, United States

Abstract

The Ti(C,N) film has been synthesised by ion beam assisted deposition in our study, in which a TiC target was bombarded by argon ion beam. Sputtreing depositionof Ti, C and bombardment with argon ion beam were done simultaneously under the environment of nitrogen gas. The component depth profiles and structure of the film were analysed by means of AES and X-ray diffraction. Our results shows that the Ti(C,N) film was composed of TiC crystallites with random orientation and composed of TiN crystallites with preferential orientation and with small grain size. It was confirmed that there is a wide intermixed region of Ti, C, N and Fe atinterface between the film and the substrate. The Ti(C,N) film formed by ion beam assisted deposition exhibits superior hardness and improvement over the wear resistance and friction properties.

Citation Download Citation

Han-wei Liu, Yunru Chen, and Hai-Tao Cai "Ti(C,N) film formed by ion-beam-assisted deposition", Proc. SPIE 3040, Smart Structures and Materials 1997: Smart Materials Technologies, (14 February 1997); https://doi.org/10.1117/12.267126

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