Influence of optical nonlinearities of the photoresist on the photolithographic process: applications

Andreas Erdmann; Clifford L. Henderson; C. Grant Willson; Wolfgang Henke

doi:10.1117/12.275810

7 July 1997 Influence of optical nonlinearities of the photoresist on the photolithographic process: applications

Andreas Erdmann, Clifford L. Henderson, C. Grant Willson, Wolfgang Henke

Proceedings Volume 3048, Emerging Lithographic Technologies; (1997) https://doi.org/10.1117/12.275810
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

Using a new simulation method, the influence of refractive index changes during the bleaching of the photoresist on process parameters is investigated. For standard applications using thin resists, refractive index changes above 0.1 result in considerably modified dose latitudes, swing curves and iso- dense bias. In special applications with thick resists, the same effect occurs for much smaller refractive index changes. Optimized refractive index changes can be used for the fabrication of structures with high aspect ratios.

Citation Download Citation

Andreas Erdmann, Clifford L. Henderson, C. Grant Willson, and Wolfgang Henke "Influence of optical nonlinearities of the photoresist on the photolithographic process: applications", Proc. SPIE 3048, Emerging Lithographic Technologies, (7 July 1997); https://doi.org/10.1117/12.275810

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