Acid diffusion control in chemical amplification positive resists by exchange reaction of conjugate bases

Toshio Sakamizu; Tadashi Arai; Hidenori Yamaguchi; Hiroshi Shiraishi

doi:10.1117/12.275845

7 July 1997 Acid diffusion control in chemical amplification positive resists by exchange reaction of conjugate bases

Toshio Sakamizu, Tadashi Arai, Hidenori Yamaguchi, Hiroshi Shiraishi

Proceedings Volume 3049, Advances in Resist Technology and Processing XIV; (1997) https://doi.org/10.1117/12.275845
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

Alkyl-substituted-onium halides (tetraalkylammonium and trialkylsulfonium halides) are investigated for possible application as an acid diffusion controller in a chemical amplification positive resist. The resist sensitivity became lower as their concentration increased because these additives can trap the catalytically active acid to produce a neutral onium salt and a catalytically inactive acid in the resist matrix. The contrast of the resist with tetramethylammonium iodide (TMNI) and trimethylsulfonium iodide (MESI), which can both produce hydrogen iodide was more than two times higher than without an additive, while the resists with other onium halides showed no evidence of contrast enhancement. An experiment on the acid diffusion range showed that the diffusion range of these iodides was much lower than with no additive, and MESI exhibited a smaller diffusion range than TMNI. This indicates that MESI is the most effective diffusion controller. Patterning of resists was carried out with an e- beam lithography system at 50 kV. The resist with MESI exhibited a remarkable resolution enhancement. It can produce high resolution patterns (90-nm contact holes) at a dose of 16.2 (mu) C/cm².

Citation Download Citation

Toshio Sakamizu, Tadashi Arai, Hidenori Yamaguchi, and Hiroshi Shiraishi "Acid diffusion control in chemical amplification positive resists by exchange reaction of conjugate bases", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); https://doi.org/10.1117/12.275845

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available