Robust i-line resist engineering using neural network and statistical design applications

Medhat A. Toukhy; David J. Brzozowy

doi:10.1117/12.275838

7 July 1997 Robust i-line resist engineering using neural network and statistical design applications

Medhat A. Toukhy, David J. Brzozowy

Proceedings Volume 3049, Advances in Resist Technology and Processing XIV; (1997) https://doi.org/10.1117/12.275838
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

The optimization of a resist formulation for performance robustness in addition to its basic lithographic performance provides added tolerance to formulation errors. This was demonstrated in this paper by the example of OiR-32 resist technology. The optimized components and the efficiency of the chemical interaction system between the novolak and the PACs of this resist are directly responsible for its robust performance.

Citation Download Citation

Medhat A. Toukhy and David J. Brzozowy "Robust i-line resist engineering using neural network and statistical design applications", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); https://doi.org/10.1117/12.275838

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