Self-limitation of laser-induced thermochemical reactions in ultrathin films

Andre A. Gorbunov; H. Eichler; Wolfgang Pompe; B. Huey; D. A. Bonnell; A. D. Akhsakhalyan

doi:10.1117/12.271666

4 April 1997 Self-limitation of laser-induced thermochemical reactions in ultrathin films

Andre A. Gorbunov, H. Eichler, Wolfgang Pompe, B. Huey, D. A. Bonnell, A. D. Akhsakhalyan

Proceedings Volume 3093, Nonresonant Laser-Matter Interaction (NLMI-9); (1997) https://doi.org/10.1117/12.271666
Event: Nonresonant Laser-Matter Interaction, 1996, St. Petersburg, Russian Federation

Abstract

Lateral self-limitation of the cw-laser-induced local oxidation of ultrathin (3-60 nm) titanium films in air is studied. It is shown, that the brightening of the films on transparent substrate upon through-oxidation forms a negative feedback to this highly-nonlinear process allowing stable writing of transparent oxide line structures narrower than the diffraction limited focused laser spot. The optimum metal film thickness to obtain the greatest optical contrast with the highest resolution is of the order of the light adsorption length in the metal. Transparent isolated oxide lines and gratings with periods down to 250 nm and line width down to 165 nm were recorded in 6 - 15 nm thick Ti films on glass by using the radiation of the Ar ion laser (lambda equals 488, 514 nm).

Citation Download Citation

Andre A. Gorbunov, H. Eichler, Wolfgang Pompe, B. Huey, D. A. Bonnell, and A. D. Akhsakhalyan "Self-limitation of laser-induced thermochemical reactions in ultrathin films", Proc. SPIE 3093, Nonresonant Laser-Matter Interaction (NLMI-9), (4 April 1997); https://doi.org/10.1117/12.271666

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