Microstructure and fractal growth mechanism of sputtered films of Bi2Sr2Ca1Cu2O7-x on Si substrates

Wensheng Qian; Liu Rong; Tongli Wei

doi:10.1117/12.300695

20 February 1998 Microstructure and fractal growth mechanism of sputtered films of Bi2Sr2Ca1Cu2O7-x on Si substrates

Wensheng Qian, Liu Rong, Tongli Wei

Proceedings Volume 3175, Third International Conference on Thin Film Physics and Applications; (1998) https://doi.org/10.1117/12.300695
Event: Third International Conference on Thin Film Physics and Applications, 1997, Shanghai, China

Abstract

Bi₂Sr₂Ca₁Cu₂O_7-x(BSCCO) superconducting films were deposited on Si substrates with buffer layers of Y- stabilized ZrO₂ films (YSZ) by magnetic sputtering. The critical temperature (Tc) of BSCCO film on YSZ/Si was 82 K. The microstructure of BSCCO/YSZ/Si was studied by scanning electronic microscope (SEM) and atom force microscope (AFM), the growing model of spiral nucleation was verified. Fractal images were found in the micrographs, and their growth mechanism was presented.

Citation Download Citation

Wensheng Qian, Liu Rong, and Tongli Wei "Microstructure and fractal growth mechanism of sputtered films of Bi2Sr2Ca1Cu2O7-x on Si substrates", Proc. SPIE 3175, Third International Conference on Thin Film Physics and Applications, (20 February 1998); https://doi.org/10.1117/12.300695

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available