Thermal stability of magneto-optical properties in TbFeCo films prepared by rf-magnetron sputtering

Rui Xiong; Zuoyi Li; Xiaofei Yang; Zuoqi Hu; Zheng Li; Gengqi Li

doi:10.1117/12.318492

10 August 1998 Thermal stability of magneto-optical properties in TbFeCo films prepared by rf-magnetron sputtering

Rui Xiong, Zuoyi Li, Xiaofei Yang, Zuoqi Hu, Zheng Li, Gengqi Li

Proceedings Volume 3562, Optical Storage Technology; (1998) https://doi.org/10.1117/12.318492
Event: Photonics China '98, 1998, Beijing, China

Abstract

The thermal stability of amorphous TbFeCo films covered with the protected AlN films prepared by the RF magnetron sputtering system was studied, in order to understand the degradation kinetics in rare-earth transition metal films. The changes of anisotropy K_u, Kerr rotation angle (theta) _k and coercivity H_c with annealing time were measured with the automatic magnetic torque apparatus and the automatic measurement system of MO Kerr effect, respectively. Data clearly show that stress relaxation is responsible for the decrease in the magneto-optical properties after thermal annealing. Furthermore, annealing studies reveal that the thermal stability of magneto-optical properties improves with increasing Ar sputtering pressure-- a trend that is in conflict with the tendency for films sputtered under low Ar pressure to be more oxidation resistant. This trend is attributed to the large stress component that exists at low Ar pressures and its tendency to decrease as a result of annealing.

Citation Download Citation

Rui Xiong, Zuoyi Li, Xiaofei Yang, Zuoqi Hu, Zheng Li, and Gengqi Li "Thermal stability of magneto-optical properties in TbFeCo films prepared by rf-magnetron sputtering", Proc. SPIE 3562, Optical Storage Technology, (10 August 1998); https://doi.org/10.1117/12.318492

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