Production of distributed phase plates using an energetic ion process

Douglas J. Smith; Joy A. Warner; Nelson E. LeBarron; Salvatore LaDelia

doi:10.1117/12.344448

7 April 1999 Production of distributed phase plates using an energetic ion process

Douglas J. Smith, Joy A. Warner, Nelson E. LeBarron, Salvatore LaDelia

Proceedings Volume 3578, Laser-Induced Damage in Optical Materials: 1998; (1999) https://doi.org/10.1117/12.344448
Event: Laser-Induced Damage in Optical Materials: 1998, 1998, Boulder, CO, United States

Abstract

Laser-driven implosion experiments require optical phase conversion to create a uniformly irradiated target. Distributed phase plates provide a quasi-random phase front that aids in beam smoothing on the target; however, the DPP must survive the high fluences of the tripled OMEGA beam at 351 nm. The continuous DPP produces higher efficiency and less risk of damage to opposing optics than the previous binary design. DPPs are created by exposing a gray scale pattern in photoresist and then etching the pattern in to silica. Several problems were solved during the development stage of ion etching DPPs. The etch uniformity was limited to less than 6 percent across a 28-cm clear aperture by modeling the 16-cm ion source and erosion characteristics of the photoresist and silica. Surface texturing was linked to overheating of the photoresist by the ion source and was solved by radiant cooling. Near-field defects capable of focusing damage in levels of fluence on downstream optics were created in the photoresist exposure process and were removed after etching. The damage thresholds of the silica surface generally increase after etching is fare is taken to avoid re-sputtering of tooling onto the optics surface. Sixty ion-etched DPPs were installed in December 1997 and, currently, damage has not been observed on the optics.

Citation Download Citation

Douglas J. Smith, Joy A. Warner, Nelson E. LeBarron, and Salvatore LaDelia "Production of distributed phase plates using an energetic ion process", Proc. SPIE 3578, Laser-Induced Damage in Optical Materials: 1998, (7 April 1999); https://doi.org/10.1117/12.344448

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
16 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Etching

Ions

Photoresist materials

Silica

Near field

Near field optics

Epoxies

Show All Keywords

Keywords/Phrases

Search In:

Publication Years