Development of an algorithm for monitoring pattern fidelity on photomasks for 0.2-um technology and beyond based on light optical CD metrology tools

Thomas Schaetz; Bernd Hay; Lars Walden; Wolfram Ziegler

doi:10.1117/12.346210

23 April 1999 Development of an algorithm for monitoring pattern fidelity on photomasks for 0.2-μm technology and beyond based on light optical CD metrology tools

Thomas Schaetz, Bernd Hay, Lars Walden, Wolfram Ziegler

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Proceedings Volume 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98; (1999) https://doi.org/10.1117/12.346210
Event: 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components, 1998, Munich, Germany

Abstract

With the ongoing shrinking of design rules, the complexity of photomasks does increase continuously. Features are getting smaller and denser, their characterization requires sophisticated procedures. Looking for the deviation from their target value and their linewidth variation is not sufficient any more. In addition, measurements of corner rounding and line end shortening are necessary to define the pattern fidelity on the mask. Otherwise printing results will not be satisfying. Contacts and small features are suffering mainly from imaging inaccuracies. The size of the contacts as an example may come out too small on the photomask and therefore reduces the process window in lithography. In order to meet customer requirements for pattern fidelity, a measurement algorithm and a measurement procedure needs to be introduced and specifications to be defined. In this paper different approaches are compared, allowing an automatic qualification of photomask by optical light microscopy based on a MueTec CD-metrology system, the newly developed MueTec 2030UV, provided with a 365 nm light source. The i-line illumination allows to resolve features down to 0.2 micrometers size with good repeatability.

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Thomas Schaetz, Bernd Hay, Lars Walden, and Wolfram Ziegler "Development of an algorithm for monitoring pattern fidelity on photomasks for 0.2-μm technology and beyond based on light optical CD metrology tools", Proc. SPIE 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98, (23 April 1999); https://doi.org/10.1117/12.346210

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KEYWORDS

Photomasks

Algorithm development

Critical dimension metrology

Scanning electron microscopy

Software development

Microscopy

Light

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