Simulation of optical lithography

Andreas Erdmann; Wolfgang Henke

doi:10.1117/12.346826

29 April 1999 Simulation of optical lithography

Andreas Erdmann, Wolfgang Henke

Proceedings Volume 3729, Selected Papers from International Conference on Optics and Optoelectronics '98; (1999) https://doi.org/10.1117/12.346826
Event: Selected Papers from the International Conference on Optics and Optoelectronics, 1998, Dehradun, India

Abstract

Simulation of photolithographic processes is widely used in semiconductor research and industry. The paper reviews physical models and capabilities of modern lithography simulators. Application of these simulation techniques to the manufacturing of microelectronic, optical and micro- optical components are discussed.

Citation Download Citation

Andreas Erdmann and Wolfgang Henke "Simulation of optical lithography", Proc. SPIE 3729, Selected Papers from International Conference on Optics and Optoelectronics '98, (29 April 1999); https://doi.org/10.1117/12.346826

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