Reaction mechanisms in silicon-based resist materials: polysilanes for deep-UV, EUV, and x-ray lithography

Shu Seki; Yusuke Sakurai; Kazuki Maeda; Yoshihisa Kunimi; Seiji Nagahara; Seiichi Tagawa

doi:10.1117/12.388326

23 June 2000 Reaction mechanisms in silicon-based resist materials: polysilanes for deep-UV, EUV, and x-ray lithography

Shu Seki, Yusuke Sakurai, Kazuki Maeda, Yoshihisa Kunimi, Seiji Nagahara, Seiichi Tagawa

Proceedings Volume 3999, Advances in Resist Technology and Processing XVII; (2000) https://doi.org/10.1117/12.388326
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The present paper describes mechanisms of photo- and radiation induced reactions in silicon based resist materials: polysilanes with Si-branchings and Si-H bondings, as a candidate for EUV and X-ray resist materials. Polysilanes have been previously confirmed to show positive-type resist properties for UV light, electron beams (EB), X-rays, etc. at any conditions. However the cross-linking reaction of the polymer became dominant in the polysilane with Si-branchings upon irradiation to UV light, EB, and ion beams. The efficiency of the cross-linking reaction strongly depended on the ratio of Si-branching giving polymer gels in the polysilane with higher amount of Si-branching than 5% even for (gamma) -ray irradiation. Polyhydrosilanes containing vinyl groups revealed to cause efficient cross-linking reactions with the presence of catalysts for hydrosilylation upon exposure to deep UV or X-rays, leading to high-sensitive negative resist materials for EUV lithography.

Citation Download Citation

Shu Seki, Yusuke Sakurai, Kazuki Maeda, Yoshihisa Kunimi, Seiji Nagahara, and Seiichi Tagawa "Reaction mechanisms in silicon-based resist materials: polysilanes for deep-UV, EUV, and x-ray lithography", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388326

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available