Paper
23 June 2000 Solid-state NMR characterization of resist formulations for 193-nm lithography: chain dynamics and length scale of mixing
Peter A. Mirau, Sharon A. Heffner, Ilya L. Rushkin, Francis M. Houlihan
Author Affiliations +
Abstract
Solid-state carbon NMR with cross polarization and magic-angle spinning has been used to study the chain dynamics and length scale of mixing in resist formulations of norbornene-maleic anhydride copolymers for 193 nm lithography. Two-dimensional wide line separation NMR has been used to measure the chain dynamics via the indirectly detected proton line shapes. The results show that the polymers do not experience large amplitude atomic fluctuations at the high temperatures (155 degrees Celsius) currently used for resist processing. Additional NMR experiments using proton spin diffusion demonstrate that the polymers and dissolution inhibitors are mixed on a molecular length scale.
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Peter A. Mirau, Sharon A. Heffner, Ilya L. Rushkin, and Francis M. Houlihan "Solid-state NMR characterization of resist formulations for 193-nm lithography: chain dynamics and length scale of mixing", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388370
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KEYWORDS
Polymers

Carbon

Lithography

Diffusion

Polarization

Solid state electronics

Solid state physics

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