Effects of cooling rates on the crystal orientation of sputtered Pb-Ti-O thin films

Ryuta Ai; Hiroaki Ito; Goh Asayama; Yoko Ichikawa; Kiyotaka Wasa

doi:10.1117/12.397861

6 September 2000 Effects of cooling rates on the crystal orientation of sputtered Pb-Ti-O thin films

Ryuta Ai, Hiroaki Ito, Goh Asayama, Yoko Ichikawa, Kiyotaka Wasa

Proceedings Volume 4058, Superconducting and Related Oxides: Physics and Nanoengineering IV; (2000) https://doi.org/10.1117/12.397861
Event: AeroSense 2000, 2000, Orlando, FL, United States

Abstract

Thin films of Pb-Ti-O families, PbTiO₃ (PT) and (Pb,La)TiO₃ (PLT), were grown at 600 degree(s)C on (100)MgO substrates by rf- magnetron sputtering at various cooling rates (3 degree(s)C/min to 33 degree(s)C/min). It is found that c-axis orientation of the PT thin films was enhanced by the increase of the cooling rates and the a- axis orientation of PT thin films was enhanced by the decrease of the cooling rates. While, c-axis orientation of the PLT thin films was achieved independent of the cooling rates. The growth mechanism of the a-axis orientation of PT thin films will be governed by an epitaxial growth and the c-axis orientation will be caused by the preferred orientation. The cooling rates are essential for the control of the orientation of PT thin films on (100)MgO substrates.

Citation Download Citation

Ryuta Ai, Hiroaki Ito, Goh Asayama, Yoko Ichikawa, and Kiyotaka Wasa "Effects of cooling rates on the crystal orientation of sputtered Pb-Ti-O thin films", Proc. SPIE 4058, Superconducting and Related Oxides: Physics and Nanoengineering IV, (6 September 2000); https://doi.org/10.1117/12.397861

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