Comparison of microstructuring irradiated by 193-nm and 308-nm lasers

Lin Zhang; Qihong Lou; Yunrong Wei; Jingxing Dong

doi:10.1117/12.432541

29 June 2001 Comparison of microstructuring irradiated by 193-nm and 308-nm lasers

Lin Zhang, Qihong Lou, Yunrong Wei, Jingxing Dong

Proceedings Volume 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI; (2001) https://doi.org/10.1117/12.432541
Event: Photonics West 2001 - LASE, 2001, San Jose, CA, United States

Abstract

In this paper, the direct ablation of polymer films of PMMA, PI, PC and K9 glass has been studied at wavelengths of 193 nm and 308 nm. The ablation characteristics of microstructuring is mainly discussed and compared. The ablation qualities of PC, PMMA and K9 glass by XeCl (308 nm, 30 ns) excimer laser are very poor. The ablation performances of PMMA and K9 glass by ArF (193 nm, 17 ns) excimer laser are medium. Smooth surfaces and sharp edges with micron transverse resolution and submicron depth precision can be obtained by the ablation of PI at 308 nm, and PI, PC at 193 nm.

Citation Download Citation

Lin Zhang, Qihong Lou, Yunrong Wei, and Jingxing Dong "Comparison of microstructuring irradiated by 193-nm and 308-nm lasers", Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); https://doi.org/10.1117/12.432541

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available