Stepper lens field critical dimension uniformity and optical proximity correction

Brian Martin

doi:10.1117/12.425244

20 April 2001 Stepper lens field critical dimension uniformity and optical proximity correction

Brian Martin

Proceedings Volume 4405, Process and Equipment Control in Microelectronic Manufacturing II; (2001) https://doi.org/10.1117/12.425244
Event: Microelectronic and MEMS Technologies, 2001, Edinburgh, United Kingdom

Abstract

Rule tables for describing optical proximity correction can be derived either from practical measurements or by means of lithography simulation. This paper shows that one set of rules may not adequately apply across the whole of the image field depending on CD uniformity across the lens field. Example measurements illustrate the problem and proposals are made for its solution.

Citation Download Citation

Brian Martin "Stepper lens field critical dimension uniformity and optical proximity correction", Proc. SPIE 4405, Process and Equipment Control in Microelectronic Manufacturing II, (20 April 2001); https://doi.org/10.1117/12.425244

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