Paper
5 April 2001 Fabrication of an electrostatic microactuator with curled p+ silicon cantilevers
Tae Gyu Park, Sang Sik Yang
Author Affiliations +
Proceedings Volume 4408, Design, Test, Integration, and Packaging of MEMS/MOEMS 2001; (2001) https://doi.org/10.1117/12.425344
Event: Design, Test, Integration, and Packaging of MEMS/MOEMS 2001, 2001, Cannes-Mandelieu, France
Abstract
The paper represents the design and fabrication of an electrostatic micro actuator with p+ Si cantilevers. The micro actuator consists of a plate suspended by four p+ silicon cantilevers and an electrode on a glass substrate. The p+ Si structure is fabricated by the boron diffusion process and the anisotropic wet etch process. The cantilevers of the micro actuator curl down because of the residual stress gradient in p+ silicon. When the electrostatic force is applied to the p+ cantilevers, the vertical displacement of the plate can be achieved. The deflection of the cantilever due to the residual stress gradient and the vertical displacement by electrostatic force were calculated. The displacement of the plate was measured with a laser displacement meter for various input voltages and frequencies. The feasibility of the proposed micro actuator for the application to optical pickup devices or optical communication devices was confirmed by the experiments.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tae Gyu Park and Sang Sik Yang "Fabrication of an electrostatic microactuator with curled p+ silicon cantilevers", Proc. SPIE 4408, Design, Test, Integration, and Packaging of MEMS/MOEMS 2001, (5 April 2001); https://doi.org/10.1117/12.425344
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KEYWORDS
Silicon

Actuators

Microactuators

Electrodes

Boron

Optical fabrication

Etching

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