Computer simulation of optoelectronic behavior in image materials

Xiao-Wei Li; Yuchen Sun; Guangsheng Fu; Lianshui Zhang; Li Han

doi:10.1117/12.445751

16 October 2001 Computer simulation of optoelectronic behavior in image materials

Xiao-Wei Li, Yuchen Sun, Guangsheng Fu, Lianshui Zhang, Li Han

Proceedings Volume 4602, Semiconductor Optoelectronic Device Manufacturing and Applications; (2001) https://doi.org/10.1117/12.445751
Event: International Symposium on Optoelectonics and Microelectronics, 2001, Nanjing, China

Abstract

Silver halide emulsion is an important component of image materials. It can develop permanent image through the absorption of light. It is widely used in many kinds of fields and has a very prosperous prospect. Now many scientists study the properties of image material, but they mainly focus on experimental methods. Computer simulation method opens up a brand-new way in the study of optoelectronic behavior in image materials. Compared with traditional experimental ways, this method is more economical and convenient and has a shorter research period. So it is a very practical method to exploit new type of image materials and perfect photosensitive theory. In this paper, Nucleation & Growth model and Monte Carlo method were adopted to simulate the optoelectronic behavior in image materials and results with different input parameters will be given.

Citation Download Citation

Xiao-Wei Li, Yuchen Sun, Guangsheng Fu, Lianshui Zhang, and Li Han "Computer simulation of optoelectronic behavior in image materials", Proc. SPIE 4602, Semiconductor Optoelectronic Device Manufacturing and Applications, (16 October 2001); https://doi.org/10.1117/12.445751

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