Holographic applications of As-S-Se inorganic resist

Sergey A. Kostyukevych; Miroslav Vlcek; Nadya L. Moskalenko; Peter E. Shepeliavii; Alexander V. Stronski; Sergey V. Svechnikov; Evgenie F. Venger

doi:10.1117/12.455188

5 February 2002 Holographic applications of As-S-Se inorganic resist

Sergey A. Kostyukevych, Miroslav Vlcek, Nadya L. Moskalenko, Peter E. Shepeliavii, Alexander V. Stronski, Sergey V. Svechnikov, Evgenie F. Venger

Author Affiliations +

Proceedings Volume 4607, Selected Papers from Fifth International Conference on Correlation Optics; (2002) https://doi.org/10.1117/12.455188
Event: Fifth International Conference on Correlation Optics, 2001, Chernivsti, Ukraine

Abstract

The present paper is concerned with the investigation of imaging properties of As-S-Se media in application for fabrication of holographic optical security elements. Structural changes in such medica under the influence of external factors (exposure or annealing) were studied. Photo- and thermally induced structural changes were directly confirmed by Raman scattering measurements. Surface relief formation properties were investigated with the help of improved amine based solvents, which provided good surface quality. Various types of holographic security elements (HSE) were fabricated and their properties studied. Fabricated surface relief provided high values of diffraction efficiency. For example, diffraction efficiency of such elements as holographic diffraction gratings consisted up to 60 - 70% in non-polarized light. High quality polymer copies of the initial HSE were obtained.

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Sergey A. Kostyukevych, Miroslav Vlcek, Nadya L. Moskalenko, Peter E. Shepeliavii, Alexander V. Stronski, Sergey V. Svechnikov, and Evgenie F. Venger "Holographic applications of As-S-Se inorganic resist", Proc. SPIE 4607, Selected Papers from Fifth International Conference on Correlation Optics, (5 February 2002); https://doi.org/10.1117/12.455188

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