Fabrication of binary photomask by femtosecond laser

Paul Stanley; Krishnan Venkatakrishnan; Bryan Kok Ann Ngoi

doi:10.1117/12.478173

16 January 2003 Fabrication of binary photomask by femtosecond laser

Paul Stanley, Krishnan Venkatakrishnan, Bryan Kok Ann Ngoi

Proceedings Volume 4981, MEMS Components and Applications for Industry, Automobiles, Aerospace, and Communication II; (2003) https://doi.org/10.1117/12.478173
Event: Micromachining and Microfabrication, 2003, San Jose, CA, United States

Abstract

A photomask is a high precision plate used in the lithographic process for the fabrication of microcomponents and it is an important prerequisite for microfabrication. A binary photomask is composed of tranasparent and opaque elements wich from one layer of a pattern. Photomasks are currently fabricated using lithographic process, which is complex and time consuming because of several steps involved in the fabrication process. In order to address this issue, a simple technique is reported in this paper which is a single-step process. The required pattern is transferred to mask blank by direct writing with femtosecond laser pulses without the aid of photoresist. The opaque layer of the mask blank is removed by femtosecond laser ablation. An acousto-optic device based non-mechanical scanning system immune to effects of vibration has been developed to scan the laser beam with high positional accuracy and scan speed. The applicability of this technique for microfabrication has been proved conclusively by fabricating microfeatures with the photomask fabricated by this technique.

Citation Download Citation

Paul Stanley, Krishnan Venkatakrishnan, and Bryan Kok Ann Ngoi "Fabrication of binary photomask by femtosecond laser", Proc. SPIE 4981, MEMS Components and Applications for Industry, Automobiles, Aerospace, and Communication II, (16 January 2003); https://doi.org/10.1117/12.478173

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