Paper
3 July 2003 Extremely high breakdown voltage in high-brightness InGaN LEDs
K. R. Wang, S. C. Huang, M. F. Yeh, Y. T. Chung, Y. W. Chang, C. J. Sun, C. T. Chung, Chuong A. Tran
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Abstract
High-brightness InGaN light emitting diodes (LEDs) with an output power of 2.7, 2.3, and 1.8 mW at a driving current of 20 mA for the emitting wavelength of 470, 505, and 525 nm, respectively, were realized using metalorganic vapor phase epitaxy. The I-V characteristic of these devices experiences a reverse-bias voltage higher than 60 V for a leak current of 10 μA. We find out that the dislocation density in the n-GaN layer is crucial to achieve such high breakdown voltage. By varying growth parameters, we can tune the breakdown voltage from 10 V to 60 V.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
K. R. Wang, S. C. Huang, M. F. Yeh, Y. T. Chung, Y. W. Chang, C. J. Sun, C. T. Chung, and Chuong A. Tran "Extremely high breakdown voltage in high-brightness InGaN LEDs", Proc. SPIE 4996, Light-Emitting Diodes: Research, Manufacturing, and Applications VII, (3 July 2003); https://doi.org/10.1117/12.485631
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KEYWORDS
Light emitting diodes

Indium gallium nitride

Gallium nitride

Sapphire

Semiconducting wafers

Semiconductor lasers

Vapor phase epitaxy

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