Replication of the nano-scale mold fabricated with focused ion beam

J. X. Gao; M. B. Chan-Park; D. Z. Xie; Bryan Kok Ann Ngoi

doi:10.1117/12.608028

8 December 2004 Replication of the nano-scale mold fabricated with focused ion beam

J. X. Gao, M. B. Chan-Park, D. Z. Xie, Bryan Kok Ann Ngoi

Proceedings Volume 5774, Fifth International Conference on Thin Film Physics and Applications; (2004) https://doi.org/10.1117/12.608028
Event: Fifth International Conference on Thin Film Physics and Applications, 2004, Shanghai, China

Abstract

Silicon mold fabricated with Focused Ion Beam lithography (FIB) was used to make silicone elastomer molds. The silicon mold is composed of lattice of holes which the diameter and depth are about 200 nm and 60 nm, respectively. The silicone elastomer material was then used to replicate slavery mold. Our study show the replication process with the elastomer mold had been performed successfully and the diameter of humps on the elastomer mold is near to that of holes on the master mold. But the height of humps in the elastomer mold is only 42 nm and it is different from the depth of holes in the master mold.

Citation Download Citation

J. X. Gao, M. B. Chan-Park, D. Z. Xie, and Bryan Kok Ann Ngoi "Replication of the nano-scale mold fabricated with focused ion beam", Proc. SPIE 5774, Fifth International Conference on Thin Film Physics and Applications, (8 December 2004); https://doi.org/10.1117/12.608028

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