Assembly of a 193-nm interferometer for immersion lithography: vibration effects on image contrast

Alex Lagrange; Anne Laure Charley; Olivier Lartigue; Marianne Derouard

doi:10.1117/12.652227

21 March 2006 Assembly of a 193-nm interferometer for immersion lithography: vibration effects on image contrast

Alex Lagrange, Anne Laure Charley, Olivier Lartigue, Marianne Derouard

Proceedings Volume 6154, Optical Microlithography XIX; 61544O (2006) https://doi.org/10.1117/12.652227
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

This document shows the modelization of the vibration effects on a hyper NA immersion interferometer at 193 nm, and their consequences on the image contrast. Finally we propose to use a active tabletop anti vibration unit and show its benefits.

Citation Download Citation

Alex Lagrange, Anne Laure Charley, Olivier Lartigue, and Marianne Derouard "Assembly of a 193-nm interferometer for immersion lithography: vibration effects on image contrast", Proc. SPIE 6154, Optical Microlithography XIX, 61544O (21 March 2006); https://doi.org/10.1117/12.652227

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