Paper
21 September 2007 Conductive distributed Bragg reflector fabricated by oblique angle deposition from a single material
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Abstract
Oblique angle deposition allows the fabrication of nano-structured porous thin films of high optical quality. By selecting the incident angle, the porosity - and thereby, the refractive index - of the deposited film can be tuned to a specific desired value. This makes it possible to fabricate multi-layer optical thin film components consisting entirely of a single material which is chosen for its properties other than refractive index, such as optical absorption or conductivity. As an application for this technique we demonstrate a conductive distributed Bragg reflector (DBR) designed for 460 nm. Common material choices in this wavelength range are SiO2 and TiO2; however, both materials are insulating. Conductive DBRs are limited to epitaxially grown doped semiconductors, which generally have low index contrast. The DBR reported here is composed entirely of indium tin oxide (ITO), chosen for its conductivity and low absorption. By varying the deposition angle a refractive index contrast of Δn = 0.4 is achieved, which yields a measured reflectivity of 72.7% for a three-period low-porosity-ITO/high-porosity-ITO DBR. The reflectivity is in excellent agreement with theory.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Martin F. Schubert, Jong Kyu Kim, Sameer Chhajed, and E. Fred Schubert "Conductive distributed Bragg reflector fabricated by oblique angle deposition from a single material", Proc. SPIE 6674, Thin-Film Coatings for Optical Applications IV, 667403 (21 September 2007); https://doi.org/10.1117/12.731266
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Cited by 4 scholarly publications.
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KEYWORDS
Refractive index

Thin films

Reflectivity

Nanorods

Distributed Bragg reflectors

Reflection

Absorption

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