Paper
31 July 2007 Nonlinear optical phenomena in phosphosilicate glass under 193 nm laser irradiation
Y. V. Larionov, V. G. Plotnichenko
Author Affiliations +
Proceedings Volume 6728, ICONO 2007: Novel Photonics Materials; Optics and Optical Diagnostics of Nanostructures; 67283G (2007) https://doi.org/10.1117/12.752473
Event: The International Conference on Coherent and Nonlinear Optics, 2007, Minsk, Belarus
Abstract
An unusual phenomenon of non-monotone change of phosphosilicate glass network, including its structural elements (i.e. inter-atomic bonds, phosphorous and siliceous point defects, ring structures of SiO4 tetrahedra) under laser irradiation at 193 nm is discovered. The phenomenon is explained by applying conceptions of the rigidity percolation theory, which describes connectivity of atoms in network, for the phosphosilicate glass under UV-exposure. Presence of phosphorous atoms in silica glass decreases the rigidity of the network in comparison with silica. Generation of point defects in the phosphosilicate network due to the two-photon light absorption decreases of the rigidity in addition and finally leads to achievement of the network rigidity threshold. This results in a transformation of the network from the rigid to a floppy mode where switches of bonds between atoms are possible. But later under exposure the network switches back into the rigid mode and the cycle of rigidity change can be repeated several times. This quasi-periodical transformation of phosphosilicate glass network leads to the corresponding change of inter-atomic bonds, point defects concentration and reconstruction of ring structures during an exposure. The presence off the network in the floppy mode affords one to explain a change off phosphosilicate glass density and induced index in a new manner.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Y. V. Larionov and V. G. Plotnichenko "Nonlinear optical phenomena in phosphosilicate glass under 193 nm laser irradiation", Proc. SPIE 6728, ICONO 2007: Novel Photonics Materials; Optics and Optical Diagnostics of Nanostructures, 67283G (31 July 2007); https://doi.org/10.1117/12.752473
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KEYWORDS
Absorption

Glasses

Chemical species

Polysomnography

Phosphosilicate glass

Silica

Switches

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