Hybrid Hopkins-Abbe method for modeling oblique angle mask effects in OPC

Konstantinos Adam; Michael C. Lam

doi:10.1117/12.776731

20 March 2008 Hybrid Hopkins-Abbe method for modeling oblique angle mask effects in OPC

Konstantinos Adam, Michael C. Lam

Proceedings Volume 6924, Optical Microlithography XXI; 69241E (2008) https://doi.org/10.1117/12.776731
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

A new method for the simulation of diffraction limited images is presented that is suitable for application in optical proximity correction and verification, where fast execution is critical. The method is given the name hybrid Hopkins-Abbe, because it is literally a hybrid of Hopkins' and Abbe's diffraction theories. The hybrid Hopkin--Abbe method resolves the problem of the traditional Hopkins theory, namely the requirement for constant mask diffraction efficiencies. Simulation of electromagnetic scattering from the mask that takes into account the oblique angles of incidence from the illumination is performed by application of the domain decomposition method that is extended for offaxis illumination. Examples of 45nm and 32nm lines and spaces through pitch and through focus are presented to demonstrate the validity and accuracy of the hybrid Hopkins-Abbe method. The results obtained are in excellent agreement with a rigorous and independent (third party) simulator. Other aspects of hybrid Hopkins-Abbe method relevant to OPC application are also discussed.

Citation Download Citation

Konstantinos Adam and Michael C. Lam "Hybrid Hopkins-Abbe method for modeling oblique angle mask effects in OPC", Proc. SPIE 6924, Optical Microlithography XXI, 69241E (20 March 2008); https://doi.org/10.1117/12.776731

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