Post cleaned surface modification treatment to prevent near pellicle haze generation in sulfate free cleaned ArF EAPSM

Manish Patil; Jong-Min Kim; Sung-Mo Jung; Ik-Boum Hur; Sang-Soo Choi; Yong Hyun Lee

doi:10.1117/12.793086

19 May 2008 Post cleaned surface modification treatment to prevent near pellicle haze generation in sulfate free cleaned ArF EAPSM

Manish Patil, Jong-Min Kim, Sung-Mo Jung, Ik-Boum Hur, Sang-Soo Choi, Yong Hyun Lee

Author Affiliations +

Proceedings Volume 7028, Photomask and Next-Generation Lithography Mask Technology XV; 70282C (2008) https://doi.org/10.1117/12.793086
Event: Photomask and NGL Mask Technology XV, 2008, Yokohama, Japan

Abstract

A lot of research has been carried on sulfate free cleaning process to minimize haze generating residual ions on mask surface. However sulfate free cleaned mask has been suffered from short life time of haze generation than we expected, because pellicle outgassing combines with ammonium residuals and formed haze near pellicle frame area and decrease yield. Therefore physical and PKL developed chemical surface modification treatment was studied and evaluated in term of near pellicle haze threshold energy, surface energy of mask substrate components (Qz/MoSi/Cr), AFM and AES depth profile. Dehydration bake treatment (physical surface modification treatment) and PKL developed chemical treatment increased near pellicle haze threshold energy by 2.5 and 4 times, respectively. Surface modification treatments didn't show negative effect on phase angle and transmittance losses of ArF EAPSM mask. The effect of illumination sources on surface modification treatment was also studied.

Citation Download Citation

Manish Patil, Jong-Min Kim, Sung-Mo Jung, Ik-Boum Hur, Sang-Soo Choi, and Yong Hyun Lee "Post cleaned surface modification treatment to prevent near pellicle haze generation in sulfate free cleaned ArF EAPSM", Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70282C (19 May 2008); https://doi.org/10.1117/12.793086

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available