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A key stage in production of the integrated optics devices is forming of microtopography on crystalline films. The
current methods generally comprise two separate steps: producing of thin film and creation a topographical pattern on it.
But the inherently large chemical stability of crystalline LiNbO3 has effectively precluded the use of standard
photolithographic patterning techniques. We present new approach based on the modified sol-gel technology using the
photosensitive gel. In this case, the photolithography is used on the stage of dried gel whereupon the direct
crystallization of patterned precursor film allows to create integrated optical element without subsequent etching of
crystalline film. Presented method of patterned thin film preparation involves synthesis of photo-reactive complex of
metal, which undergoes change under the UV light. This technology has allowed to obtain first samples of different
types of waveguide devices.
Armen R. Poghosyan,Ruyan Guo,Stepan G. Grigoryan,Aleksandr L. Manukyan, andEduard S. Vardanyan
"Modified sol-gel method for patterned lithium niobate thin film preparation", Proc. SPIE 7056, Photonic Fiber and Crystal Devices: Advances in Materials and Innovations in Device Applications II, 705614 (2 September 2008); https://doi.org/10.1117/12.793810
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Armen R. Poghosyan, Ruyan Guo, Stepan G. Grigoryan, Aleksandr L. Manukyan, Eduard S. Vardanyan, "Modified sol-gel method for patterned lithium niobate thin film preparation," Proc. SPIE 7056, Photonic Fiber and Crystal Devices: Advances in Materials and Innovations in Device Applications II, 705614 (2 September 2008); https://doi.org/10.1117/12.793810