Preliminary design of a two-dimensional electron beam position monitor system for multiple-electron-beam-direct-write lithography

Sheng-Yung Chen; Kuen-Yu Tsai; Hoi-Tou Ng; Chi-Hsiang Fan; Ting-Hang Pei; Chieh-Hsiung Kuan; Yung-Yaw Chen; Jia-Yush Yen

doi:10.1117/12.837048

14 December 2009 Preliminary design of a two-dimensional electron beam position monitor system for multiple-electron-beam-direct-write lithography

Sheng-Yung Chen, Kuen-Yu Tsai, Hoi-Tou Ng, Chi-Hsiang Fan, Ting-Hang Pei, Chieh-Hsiung Kuan, Yung-Yaw Chen, Jia-Yush Yen

Author Affiliations +

Proceedings Volume 7520, Lithography Asia 2009; 75202K (2009) https://doi.org/10.1117/12.837048
Event: SPIE Lithography Asia, 2009, Taipei, Taiwan

Abstract

Multiple-electron-beam-direct-write lithography is one of the promising candidates for next-generation lithography because of its high resolution and ability of maskless operation. In order to achieve the throughput requirement for highvolume manufacturing, miniaturized electro-optics elements are utilized in order to drive massively parallel beams simultaneously. Electron beam drift problems can become quite serious in multiple-beam systems. Periodic recalibration with reference markers on the wafer has been utilized in single-beam systems to achieve beam placement accuracy. This technique becomes impractical with multiple beams. In this work, architecture of a two dimensional beam position monitor system for multiple-electron-beam lithography is proposed. It consists of an array of miniaturized electron detectors placed above the wafer to detect backscattered electrons. The relation between beam drift and distribution of backscattered-electron trajectories is simulated by an in-house Monte Carlo electron-scattering simulator. Simulation results indicate that electron beam drift may be effectively estimated from output signals of detector array with some array signal processing to account for cross-coupling effects between beams.

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Sheng-Yung Chen, Kuen-Yu Tsai, Hoi-Tou Ng, Chi-Hsiang Fan, Ting-Hang Pei, Chieh-Hsiung Kuan, Yung-Yaw Chen, and Jia-Yush Yen "Preliminary design of a two-dimensional electron beam position monitor system for multiple-electron-beam-direct-write lithography", Proc. SPIE 7520, Lithography Asia 2009, 75202K (14 December 2009); https://doi.org/10.1117/12.837048

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