Design and simulation for the bifocal microlens in thick film lithography

Xionggui Tang; Rongguo Lu; Jinkun Liao; Heping Li; Lin Zhang; Yongzhi Liu

doi:10.1117/12.865995

22 October 2010 Design and simulation for the bifocal microlens in thick film lithography

Xionggui Tang, Rongguo Lu, Jinkun Liao, Heping Li, Lin Zhang, Yongzhi Liu

Proceedings Volume 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; 76571S (2010) https://doi.org/10.1117/12.865995
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China

Abstract

The bifocal microlens are novel optical components, which have the capability of producing two focal points along optical axis. They have potential application in readout of dual-layer disks, optical tweezer, optical coherence tomography and microfluidic system. In this paper, the design for the bifocal microlens has been presented. The distortion of the pattern transfer process in the thick film lithography has been analyzed. The modified grayscale mask method has been introduced to compensate the distortion of the pattern transfer process. The simulation for fabrication of the bifocal microlens in the thick film lithography has been performed, which shows that the simulated profile is closely consistent with the designed one. Through our proposed method, the bifocal microlens with high profile quality can be obtained, and consequently this can greatly improve its optical performance. Furthermore, the fabrication process is relatively easy and the cost is low, which is favorable to the future application of the bifocal microlens.

Citation Download Citation

Xionggui Tang, Rongguo Lu, Jinkun Liao, Heping Li, Lin Zhang, and Yongzhi Liu "Design and simulation for the bifocal microlens in thick film lithography", Proc. SPIE 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 76571S (22 October 2010); https://doi.org/10.1117/12.865995

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KEYWORDS

Microlens

Lithography

Photomasks

Distortion

Device simulation

Picture Archiving and Communication System

Refractive index

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