Paper
13 May 2010 Ultra-low threshold lasing in silica whispering-gallery-mode microcavities with Nd3+:Gd2O3 nanocrystals
Guoping Lin, Olivier Tillement, Yves Candela, Matteo Martini, Zhiping Cai, Valérie Lefèvre-Seguin, Jean Hare
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Abstract
The laser performances of silica microspheres functionalized by neodymium doped gadolinium oxide nanocrystals are investigated. First, we have developed a new method to identify and selectively excite small mode volume WGMs using a tapered fiber coupler. The electromagnetic-field distribution ofWGMs is mapped by the excitation efficiency, providing a measurement of the near field intensity. Moreover a method to characterize the ultra-low threshold microlaser is presented here, which relies on the use of the thermal bistability effect: the thermal drift of the resonance line which slows down the power scanning help us to detect the onset of laser effect on the emitted light. Finally, a single mode lasing at 1088.2 nm with threshold as low as 65 nW is achieved, for a quality factor at lasing wavelength of 1.4 × 108.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Guoping Lin, Olivier Tillement, Yves Candela, Matteo Martini, Zhiping Cai, Valérie Lefèvre-Seguin, and Jean Hare "Ultra-low threshold lasing in silica whispering-gallery-mode microcavities with Nd3+:Gd2O3 nanocrystals", Proc. SPIE 7716, Micro-Optics 2010, 771622 (13 May 2010); https://doi.org/10.1117/12.853915
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Cited by 4 scholarly publications.
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KEYWORDS
Silica

Optical microcavities

Nanocrystals

Laser damage threshold

Optical spheres

Thermal effects

Fiber couplers

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