Paper
29 November 2010 Frequency dependence in the initiation of ultrafast laser-induced damage
Author Affiliations +
Abstract
Numerous studies have investigated the role of photoionization in ultrafast laser-induced damage of bulk dielectrics. This study examines the role of spectral width and instantaneous laser frequency in laser-induced damage using a frequency dependent multiphoton ionization model and numerical simulation of an 800 nm laser pulse propagating through fused silica. When the individual photon wavelengths are greater than 827 nm, an additional photon is required for photoionization, reducing the probability of the event by many orders of magnitude. Simulation results suggest that this frequency dependence may significantly affect the processes of laser-induced damage and filamentation.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jeremy R. Gulley "Frequency dependence in the initiation of ultrafast laser-induced damage", Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 78420U (29 November 2010); https://doi.org/10.1117/12.867347
Lens.org Logo
CITATIONS
Cited by 4 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Laser induced damage

Ultrafast phenomena

Pulsed laser operation

Plasma

Silica

Ionization

Absorption

Back to Top