Sub-100 nm pattern formation by roll-to-roll nanoimprint

Ryoichi Inanami; Tomoko Ojima; Kazuto Matsuki; Takuya Kono; Tetsuro Nakasugi

doi:10.1117/12.916584

21 March 2012 Sub-100 nm pattern formation by roll-to-roll nanoimprint

Ryoichi Inanami, Tomoko Ojima, Kazuto Matsuki, Takuya Kono, Tetsuro Nakasugi

Proceedings Volume 8323, Alternative Lithographic Technologies IV; 83231J (2012) https://doi.org/10.1117/12.916584
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Technologies for pattern fabrication on a flexible substrate are being developed for various flexible devices. A patterning technique for a smaller pattern of the order of sub-100 nm will be needed in the near future. Roll-to-roll Nano-Imprint Lithography (RtR-NIL) is promising candidate for extremely low-cost fabrication of large-area devices in large volumes. We have tried to transfer sub-100 nm patterns, especially sub-30 nm patterns, onto ultraviolet (UV) curable resin on film substrate by RtR-NIL. We demonstrate a 24 nm pattern on a film substrate by RtR-NIL and the method's potential for sub-100 nm patterning.

Citation Download Citation

Ryoichi Inanami, Tomoko Ojima, Kazuto Matsuki, Takuya Kono, and Tetsuro Nakasugi "Sub-100 nm pattern formation by roll-to-roll nanoimprint", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231J (21 March 2012); https://doi.org/10.1117/12.916584

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