Impact of non-uniform polarized illumination on hyper-NA lithography

Xuejia Guo; Yanqiu Li

doi:10.1117/12.916307

13 March 2012 Impact of non-uniform polarized illumination on hyper-NA lithography

Xuejia Guo, Yanqiu Li

Proceedings Volume 8326, Optical Microlithography XXV; 832623 (2012) https://doi.org/10.1117/12.916307
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Conventional top-hat model of polarized illumination loses its accuracy in lithography simulation which cannot meet the requirements of 45nm node lithography and beyond. The simulation error of top-hat model in evaluating lithography performance cannot be neglected anymore. In this paper, we apply a Gaussian model to represent the non-uniform degree of polarization (NU-DOP) distribute across the pupil and evaluate its impact on the CD uniformity under various conditions. The result shows that the model can accurately evaluate the non-uniform property of polarized illuminator. When the mean NU-DOP approaches to 1, the effect of non-uniformity becomes more pronounced. Furthermore, the non-uniform of DOP distribution causes more CD error at defocus position.

Citation Download Citation

Xuejia Guo and Yanqiu Li "Impact of non-uniform polarized illumination on hyper-NA lithography", Proc. SPIE 8326, Optical Microlithography XXV, 832623 (13 March 2012); https://doi.org/10.1117/12.916307

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