Paper
11 October 2013 Single-etch step grating couplers for SOI waveguides
Nicolas Ayotte, Kéven Bédard, Sophie LaRochelle
Author Affiliations +
Proceedings Volume 8915, Photonics North 2013; 89150X (2013) https://doi.org/10.1117/12.2042095
Event: Photonics North 2013, 2013, Ottawa, Canada
Abstract
Single-etch grating couplers provide efficient light coupling from optical fibers to photonic waveguides while having a very low fabrication complexity. Here, the use of a coupling coefficient profile solution permits an efficient optimization of the grating apodization profile and yields a simulated -4.8 dB coupling at 1550 nm. A very compact way to reduce back-reflections by up to 8 dB, by inserting a simple anti-reflective section, is also numerically investigated. Some proximity effects and minimum features of the 248 nm deep-ultraviolet lithography had a detrimental effect on the fabricated designs and the best experimental results were -7.5 dB. Nonetheless, these gratings, requiring a single-etch step fabrication process, should be useful when using e-beam prototyping.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nicolas Ayotte, Kéven Bédard, and Sophie LaRochelle "Single-etch step grating couplers for SOI waveguides", Proc. SPIE 8915, Photonics North 2013, 89150X (11 October 2013); https://doi.org/10.1117/12.2042095
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Optical design

Waveguides

Refractive index

Silicon

Apodization

Lithography

Deep ultraviolet

Back to Top