Augmented methods for growth and development of novel multi-cation oxides

Hideki Yamamoto; Yoshiharu Krockenberger; Michio Naito

doi:10.1117/12.2045292

8 March 2014 Augmented methods for growth and development of novel multi-cation oxides

Hideki Yamamoto, Yoshiharu Krockenberger, Michio Naito

Proceedings Volume 8987, Oxide-based Materials and Devices V; 89870V (2014) https://doi.org/10.1117/12.2045292
Event: SPIE OPTO, 2014, San Francisco, California, United States

Abstract

Multi-cation oxides with crystalline perfection known from single crystals of Si or Ge are a challenge not only for basic research but also towards a revolution of oxide electronic materials. Here, we present our approach for the synthesis of high-quality thin films of multi-cation oxides. We show that our synthesis method, using state-of the-art molecular beam epitaxy (MBE), facilitates for the design of new materials. We geared our MBE system with a precise rate control system of each constituent cation flux as well as activated oxygen (O*) and ozone (O³). The resulting performances of our MBE setup are unmatched with respect to high-quality film growth as well as multi-cation flexibility by demonstrating growth of various cuprate-, scandate-, argentate-, titanate-, and ruthenate thin films. Such augmented methods are key to novel materials and go well beyond the artificial stacking of known materials and lattices.

Citation Download Citation

Hideki Yamamoto, Yoshiharu Krockenberger, and Michio Naito "Augmented methods for growth and development of novel multi-cation oxides", Proc. SPIE 8987, Oxide-based Materials and Devices V, 89870V (8 March 2014); https://doi.org/10.1117/12.2045292

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