Paper
23 September 2015 Depth determination of critical fluence-limiting defects within planarized and non-planarized mirror coatings
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Abstract
Multilayer interference optical mirror coatings are traditionally fluence-limited by nodular inclusions. Planarization of these defects modifies the geometrically and interference-induced light intensification to increase the laser resistance of mirror coatings. Previous studies using engineered defects on the substrate or buried in the middle of the coating stack have focused only on understanding the improvement in laser resistance. However, real coating defects are distributed throughout the coating. To better understand differences between the critical fluence-limiting defects of both planarized and non-planarized mirror coatings, laser damage pit depths were determined as a function of laser fluence.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christopher J. Stolz, Justin E. Wolfe, Paul B. Mirkarimi, James A. Folta, John J. Adams, Marlon G. Menor, Rajesh Raman, Norm Neilsen, Mary Norton, Ronald Luthi, Nick E. Teslich, Carmen S. Menoni, and Dinesh Patel "Depth determination of critical fluence-limiting defects within planarized and non-planarized mirror coatings", Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 96271C (23 September 2015); https://doi.org/10.1117/12.2197349
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Cited by 1 scholarly publication.
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KEYWORDS
Silica

Mirrors

Laser induced damage

Etching

Thin film coatings

Optical coatings

Resistance

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