Paper
23 November 2015 Investigating the relationship between material properties and laser-induced damage threshold of dielectric optical coatings at 1064 nm
Riccardo Bassiri, Caspar Clark, Iain W. Martin, Ashot Markosyan, Peter G. Murray, Joseph Tessmer, Sheila Rowan, Martin M. Fejer
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Abstract
The Laser Induced Damage Threshold (LIDT) and material properties of various multi-layer amorphous dielectric optical coatings, including Nb2O5, Ta2O5, SiO2, TiO2, ZrO2, AlN, SiN, LiF and ZnSe, have been studied. The coatings were produced by ion assisted electron beam and thermal evaporation; and RF and DC magnetron sputtering at Helia Photonics Ltd, Livingston, UK. The coatings were characterized by optical absorption measurements at 1064 nm by Photothermal Common-path Interferometry (PCI). Surface roughness and damage pits were analyzed using atomic force microscopy. LIDT measurements were carried out at 1064 nm, with a pulse duration of 9.6 ns and repetition rate of 100 Hz, in both 1000-on-1 and 1-on-1 regimes. The relationship between optical absorption, LIDT and post-deposition heat-treatment is discussed, along with analysis of the surface morphology of the LIDT damage sites showing both coating and substrate failure.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Riccardo Bassiri, Caspar Clark, Iain W. Martin, Ashot Markosyan, Peter G. Murray, Joseph Tessmer, Sheila Rowan, and Martin M. Fejer "Investigating the relationship between material properties and laser-induced damage threshold of dielectric optical coatings at 1064 nm", Proc. SPIE 9632, Laser-Induced Damage in Optical Materials: 2015, 963204 (23 November 2015); https://doi.org/10.1117/12.2194784
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Cited by 5 scholarly publications.
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KEYWORDS
Absorption

Optical coatings

Laser damage threshold

Laser induced damage

Annealing

Atomic force microscopy

Sputter deposition

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