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3 October 2022 Improving topological boundary states in photonic metasurfaces via profile engineering
Anton Vakulenko, Svetlana Kiriushechkina, Daria A. Smirnova, Yuma Kawaguchi, Kai Chen, Sriram Guddala, Filipp Komissarenko, Monica S. Allen, Jeffery W. Allen, Alexander B. Khanikaev
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Proceedings Volume PC12195, Metamaterials, Metadevices, and Metasystems 2022; PC121951S (2022) https://doi.org/10.1117/12.2633414
Event: SPIE Nanoscience + Engineering, 2022, San Diego, California, United States
Abstract
In this work we propose a method to achieve improved topological edge sates by engineering an optimal profile of the transition at the boundary between topological and trivial domains. From experiment and simulation results we confirmed that the quality factor of edge state for smooth transition profile can be increased by more than an order compared to the edge state of a conventional step profile. At the same time the modes retained their topological resilience, which, when combined with the reduced radiative leakage, enables robust photonic transport over long distances even above the light line.
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Anton Vakulenko, Svetlana Kiriushechkina, Daria A. Smirnova, Yuma Kawaguchi, Kai Chen, Sriram Guddala, Filipp Komissarenko, Monica S. Allen, Jeffery W. Allen, and Alexander B. Khanikaev "Improving topological boundary states in photonic metasurfaces via profile engineering", Proc. SPIE PC12195, Metamaterials, Metadevices, and Metasystems 2022, PC121951S (3 October 2022); https://doi.org/10.1117/12.2633414
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KEYWORDS
Interfaces
Backscatter
Near infrared
Silicon
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