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11 November 2022 Holistic imaging for yield improvements enabled by high-availability, and low-environmental impact Cymer ArFi lightsource
Siqi Luo, Will Conley, James Bonefede, Natallia Karlitskaya, Thomas Yang, david manley, peter Oh, Rajasekhar Rao, marc sells, Josh thornes
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Proceedings Volume PC12293, Photomask Technology 2022; PC122930H (2022) https://doi.org/10.1117/12.2648306
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States
Abstract
In this presentation, the authors will review the next generation light source with improvement in speckle reduction for improved device performance yield in next generation device nodes. Further improvements in local critical dimension uniformity (LCDU) from improvement optics that significantly reduces speckle. Overall system availability continues to increase due to significant improvements in module lifetimes which continue to contribute to productivity improvements. We continue to focus on reducing the environmental impact through the reduction and eventual elimination of helium gas which reduces supply issue risks. Lastly, we continue to focus on technology improvements that reduces energy consumption to reduce cost and ecological impact.
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Siqi Luo, Will Conley, James Bonefede, Natallia Karlitskaya, Thomas Yang, david manley, peter Oh, Rajasekhar Rao, marc sells, and Josh thornes "Holistic imaging for yield improvements enabled by high-availability, and low-environmental impact Cymer ArFi lightsource", Proc. SPIE PC12293, Photomask Technology 2022, PC122930H (11 November 2022); https://doi.org/10.1117/12.2648306
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KEYWORDS
Yield improvement
Speckle
Helium
Light sources
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