Evaluating the role of photoacid generator loadings on EUV film homogeneity and byproduct production

Jander Cruz; Michael Shaw; Emile Schweikert; Stanislav V. Verkhoturov; Michael J. Eller

doi:10.1117/12.2687714

22 November 2023 Evaluating the role of photoacid generator loadings on EUV film homogeneity and byproduct production

Jander Cruz, Michael Shaw, Emile Schweikert, Stanislav V. Verkhoturov, Michael J. Eller

Proceedings Volume PC12750, International Conference on Extreme Ultraviolet Lithography 2023; PC127500K (2023) https://doi.org/10.1117/12.2687714
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

In this study we examined a series of model EUV resists varying in photoacid generator, PAG, or photodecomposable quencher, PDQ loading and their effects on resist uniformity using Nano-Projectile Secondary Ion Mass Spectrometry, NP-SIMS. The EUV resists we examined consisted of a 40:60 random co-polymer of polytertbutylmethacrylate and polyhydroxylstyrene. NP-SIMS analysis revealed changes in the film composition evidenced by changes in both the abundance of characteristic secondary ions and homogeneity of analyte species. The resists were loaded with varying amounts of PAG – triphenylsulfonium and perfluorobutylsulfonium, and PDQ- triphenylsulfonium and p-cyanobenzoate. Examining different formulations before and after treatment revealed differences in homogeneity of the resist and differences in resist performance.

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Jander Cruz, Michael Shaw, Emile Schweikert, Stanislav V. Verkhoturov, and Michael J. Eller "Evaluating the role of photoacid generator loadings on EUV film homogeneity and byproduct production", Proc. SPIE PC12750, International Conference on Extreme Ultraviolet Lithography 2023, PC127500K (22 November 2023); https://doi.org/10.1117/12.2687714

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KEYWORDS

Photoacid generators

Extreme ultraviolet

Ions

Design and modelling

Mass spectrometry

Polymers

Quenching

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