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RI offers EUV reflectometers with “spectroscopic reflectometry” measuring spectral reflectance curves in 5 seconds and excelling in spectral resolution. For quality verification our AIMER™ concept condenses the spectral reflectance into one single figure of merit, the “scanner effective reflectance”. Acquiring 20×20 mm2 with 4 Megapixels is within seconds. Many of our EUVL tools use the AIMER, as for example the EUV-PRTT, which is now standard in EUV pellicle supply chain. With this development, we upgraded our tool platforms towards ultra-cleanliness and improved reliability. Combining the experience on spectral and AIMER reflectometry with the new generic platform yields our new EUV-MBR-4.0.
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Rainer Lebert, Andreas Biermanns-Foeth, Christoph Phiesel, Thomas Missalla, "Flexible, actinic EUV mask blank reflectometer EUV-MBR 4.0," Proc. SPIE PC12750, International Conference on Extreme Ultraviolet Lithography 2023, PC127500Z (22 November 2023); https://doi.org/10.1117/12.2687771