Curvilinear mask embodiment for high NA: an imaging perspective

Parul Dhagat; Sofia Leitao; Sander Blok; Laurens de Winter; Eelco van Setten

doi:10.1117/12.2691085

22 November 2023 Curvilinear mask embodiment for high NA: an imaging perspective

Parul Dhagat, Sofia Leitao, Sander Blok, Laurens de Winter, Eelco van Setten

Proceedings Volume PC12750, International Conference on Extreme Ultraviolet Lithography 2023; PC1275013 (2023) https://doi.org/10.1117/12.2691085
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Conference Poster

Abstract

Curvilinear mask is known to alleviate the mask making restrictions based on shortest distance between two features. In this study we focus on the impact of using curvilinear mask shapes for high NA. We use diffraction-based analysis to explain some of the observations that favors the use of curvilinear shapes as compared to Manhattan shapes. The benefits observed are dose gain, as well as larger defect-based process window.

Citation Download Citation

Parul Dhagat, Sofia Leitao, Sander Blok, Laurens de Winter, and Eelco van Setten "Curvilinear mask embodiment for high NA: an imaging perspective", Proc. SPIE PC12750, International Conference on Extreme Ultraviolet Lithography 2023, PC1275013 (22 November 2023); https://doi.org/10.1117/12.2691085

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