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13 March 2024 NIL enabled mass production of visible meta-optics
Bradley R. Williams, Daniel Bacon-Brown, Matthew C. C. George, Rumyana Petrova, Adam W. Korb, Jamie C. Stocks
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Proceedings Volume PC12898, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII; PC128980U (2024) https://doi.org/10.1117/12.3008763
Event: SPIE OPTO, 2024, San Francisco, California, United States
Abstract
Meta-optics have been gaining momentum in the last few years. The meta-atoms for IR range applications are large enough and can be patterned by traditional semiconductor lithography. Making meta-optics in the visible range of 400 to 600nm, the meta-atom structures become too small and the optical lithography falls short. Moxtek has established a manufacturing line enabled by nanoimprint lithography (NIL) that can pattern and build visible range meta-optics. This process has shown proven total efficiency greater than 90% at 532nm wavelength on a baseline over multiple lots. This data set for visible meta-optics, confirms that volume manufacturing of visible wavelength metalens is possible and the patterning barrier has been removed.
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Bradley R. Williams, Daniel Bacon-Brown, Matthew C. C. George, Rumyana Petrova, Adam W. Korb, and Jamie C. Stocks "NIL enabled mass production of visible meta-optics", Proc. SPIE PC12898, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII, PC128980U (13 March 2024); https://doi.org/10.1117/12.3008763
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KEYWORDS
Nanoimprint lithography
Manufacturing
Optical lithography
Design and modelling
Industrial applications
Industry
Infrared radiation
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